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Magnetron sputterer SSG-50M
In order for samples in electron microscopes to be imaged, they need to be electrically conductive, by forming a coating of a conductive layer on the sample, which is used to suppress charge, reduce thermal damage, and improve the secondary electron signal required for localization inspection in the SEM.
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400-8866-090

  • Product Overview
  • Product Characteristics
  • Test principle 

    In a closed chamber, an anode target is placed, gas is filled, a certain vacuum is maintained, and a high voltage is loaded between the anode and the cathode, and the glow discharge phenomenon occurs. The ionized gas ions bombard and attack the anode target. As a result, the target atoms diffuse in all directions, deposited within a certain range under the constraints of the magnetic force, and finally form a uniform coating on the surface of the sample. This coating can suppress the charge, reduce thermal damage, and increase the secondary electron yield, thereby improving the scanning electron microscope observation effect.

    In normal use, the most common target is the gold target. It is for this reason that the ion sputtering instrument is also commonly known as the "gold spraying instrument". However, in order to achieve finer grain sizes and thinner continuous coatings, other targets (e.g. chromium, platinum, copper) are sometimes used.

    Technical parameters

    Sample chamber size: cylindrical, diameter 150mm x height 120mm;

    Vacuum degree of sample cavity: ultimate vacuum: <0.1Pa, working vacuum: 0-10Pa, constant pressure control;

    Sample stage: 8-15 samples can be loaded, and the height adjustable range is 40mm;

    Target: Au target is standard, Pt, Cu (option) specification: diameter 57mm x 0.1mm thickness;

    Sputtering current: microprocessor controlled, safety interlock, adjustable, maximum current 200mA, programmed digital control;

    Sputtering head: low-voltage planar magnetron, fast target replacement, surrounding dark area shield;

    Vacuum gauge: Pirani vacuum gauge, measuring range: 0.01Pa - atmospheric pressure;

    Vacuum pump: two-stage direct-connected high-speed vacuum pump, pumping speed: 66L/min, vacuum degree: 10-2Pa;

    Thickness monitoring: use a high-resolution thickness monitor to accurately determine the thickness of the coating; (Optional)

    Operation mode: touch screen control, manual and automatic mode optional, easy to operate;

    Chassis design: 40*35*50cm in length, width and height, sturdy and corrosion-proof cabinet, with power, voltage, current, vacuum and other displays.


    Sample chamber size: cylindrical, diameter 150mm x height 120mm;

    Vacuum degree of sample cavity: ultimate vacuum: <0.1Pa, working vacuum: 0-10Pa, constant pressure control;

    Sample stage: 8-15 samples can be loaded, and the height adjustable range is 40mm;

    Target: Au target is standard, Pt, Cu (option) specification: diameter 57mm x 0.1mm thickness;

    Sputtering current: microprocessor controlled, safety interlock, adjustable, maximum current 200mA, programmed digital control;

    Sputtering head: low-voltage planar magnetron, fast target replacement, surrounding dark area shield;

    Vacuum gauge: Pirani vacuum gauge, measuring range: 0.01Pa - atmospheric pressure;

    Vacuum pump: two-stage direct-connected high-speed vacuum pump, pumping speed: 66L/min, vacuum degree: 10-2Pa;

    Thickness monitoring: Accurate determination of the thickness of the coating using a high-resolution thickness monitor (optional)

    Operation mode: touch screen control, manual and automatic mode optional, easy to operate;

    Chassis design: 40*35*50cm in length, width and height, sturdy and corrosion-proof cabinet, with power, voltage, current, vacuum and other displays.


    0.101542s